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Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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No edit summary
Line 36: Line 36:
|-
|-
|Electromagnetic coils (EM) 'outer coil' / 'inner coil'
|Electromagnetic coils (EM) 'outer coil' / 'inner coil'
|'0-10 A' / '0-30 A'
|'2 A' / '30 A'


|-
|-
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