Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions

From LabAdviser
Jump to navigation Jump to search
No edit summary
No edit summary
Line 3: Line 3:


<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px">
<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px">
File:C09721_center_05.jpg
 
File:C09721_center_07.jpg
File:C09721_center_10.jpg
File:C09721_center_10.jpg
File:C09721_center_18.jpg
File:C09721_center_18.jpg
File:C09721_center_21.jpg
File:C09721_center_21.jpg
File:C09721_center_07.jpg
File:C09721_center_05.jpg
File:C09721_center_22.jpg
File:C09721_center_22.jpg
</gallery>
</gallery>


<gallery caption="EM tests with Cr mask on wafer piece on Si carrier 6 min etch" perrow="6" widths="200px" heights="150px">
<gallery caption="EM tests with Cr mask on wafer piece on Si carrier 6 min etch" perrow="6" widths="200px" heights="150px">
File:C10022_03__06.jpg
File:C10022_03__04.jpg
File:C10022_03__02.jpg
File:C10022_03__02.jpg
File:C10022_03__04.jpg
File:C10022_03__06.jpg
File:C10022_03__08.jpg
File:C10022_03__08.jpg
File:C10022_03__10.jpg
File:C10022_03__10.jpg
Line 21: Line 23:


<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px">
<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px">
File:C10025_03__11.jpg
File:C10025_03__09.jpg
File:C10025_03__07.jpg
File:C10025_03__05.jpg
File:C10025_03__03.jpg
File:C10025_03__01.jpg
File:C10025_03__01.jpg
File:C10025_03__03.jpg
File:C10025_03__05.jpg
File:C10025_03__07.jpg
File:C10025_03__09.jpg
File:C10025_03__11.jpg
</gallery>
</gallery>


<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px">
<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px">
File:C10026_03__05.jpg
File:C10026_03__03.jpg
File:C10026_03__01.jpg
File:C10026_03__01.jpg
File:C10026_03__03.jpg
File:C10026_03__05.jpg
File:C10026_03__07.jpg
File:C10026_03__07.jpg
File:C10026_03__09.jpg
File:C10026_03__09.jpg
File:C10026_03__10.jpg
File:C10026_03__10.jpg
</gallery>
</gallery>

Revision as of 13:57, 21 September 2023

Feedback to this page: click here
Unless otherwise stated, all content in this section was done by Berit Herstrøm, DTU Nanolab

  • EM tests with Cr mask on full wafer 6 min etch
  • C09721 center 10.jpg
  • C09721 center 18.jpg
  • C09721 center 21.jpg
  • C09721 center 07.jpg
  • C09721 center 05.jpg
  • C09721 center 22.jpg
  • EM tests with Cr mask on wafer piece on Si carrier 6 min etch
  • C10022 03 06.jpg
  • C10022 03 04.jpg
  • C10022 03 02.jpg
  • C10022 03 08.jpg
  • C10022 03 10.jpg
  • C10022 03 12.jpg
  • EM tests with Cr mask on full wafer 6 min etch
  • C10025 03 11.jpg
  • C10025 03 09.jpg
  • C10025 03 07.jpg
  • C10025 03 05.jpg
  • C10025 03 03.jpg
  • C10025 03 01.jpg
  • EM tests with Cr mask on full wafer 6 min etch
  • C10026 03 05.jpg
  • C10026 03 03.jpg
  • C10026 03 01.jpg
  • C10026 03 07.jpg
  • C10026 03 09.jpg
  • C10026 03 10.jpg
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2_Etch/Cr_mask&oldid=47498"