Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions

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<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px">
<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px">
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</gallery>
</gallery>


<gallery caption="EM tests with Cr mask on wafer piece on Si carrier 6 min etch" perrow="6" widths="200px" heights="150px">
<gallery caption="EM tests with Cr mask on wafer piece on Si carrier 6 min etch" perrow="6" widths="200px" heights="150px">
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<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px">
<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px">
File:C10025_03__11.jpg
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File:C10025_03__07.jpg
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File:C10025_03__11.jpg
</gallery>
</gallery>


<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px">
<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px">
File:C10026_03__05.jpg
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File:C10026_03__05.jpg
File:C10026_03__07.jpg
File:C10026_03__07.jpg
File:C10026_03__09.jpg
File:C10026_03__09.jpg
File:C10026_03__10.jpg
File:C10026_03__10.jpg
</gallery>
</gallery>

Revision as of 12:57, 21 September 2023

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Unless otherwise stated, all content in this section was done by Berit Herstrøm, DTU Nanolab

  • EM tests with Cr mask on full wafer 6 min etch
  • EM tests with Cr mask on wafer piece on Si carrier 6 min etch
  • EM tests with Cr mask on full wafer 6 min etch
  • EM tests with Cr mask on full wafer 6 min etch
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