Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2_Etch/Cr_mask click here]'''
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<gallery caption="EM tests with Cr mask on full wafer 6 min etch" perrow="3" widths="400px" heights="300px">
File:C09721_center_05.jpg
File:C09721_center_07.jpg
File:C09721_center_10.jpg
File:C09721_center_18.jpg
File:C09721_center_21.jpg
File:C09721_center_22.jpg
</gallery>

Revision as of 13:40, 21 September 2023

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Unless otherwise stated, all content in this section was done by Berit Herstrøm, DTU Nanolab

  • EM tests with Cr mask on full wafer 6 min etch
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