Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions

Revision as of 14:40, 14 September 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,178 edits →System calibration ← Older edit		Revision as of 14:40, 14 September 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,178 edits →Auto Gain Correction - AGCRG Newer edit →
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	===Auto Gain Correction - AGCRG===		==Auto Gain Correction - AGCRG==
	Alignment is done by scanning the beam over the alignment marks and recording the backscatter electron intensity. Thus, it is essential that the gain of the detector system is set to match the substrate material, the mark material and the beam current.		Alignment is done by scanning the beam over the alignment marks and recording the backscatter electron intensity. Thus, it is essential that the gain of the detector system is set to match the substrate material, the mark material and the beam current.