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Specific Process Knowledge/Lithography/EBeamLithography/JEOLRequest: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
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*Previously there was also a limit on the duration of a single session. Initially we will not impose a strict limit on this but during the request process we will work with the user to find a reasonable duration.
*Previously there was also a limit on the duration of a single session. Initially we will not impose a strict limit on this but during the request process we will work with the user to find a reasonable duration.


*Long exposure will always be placed at the end of a day to free up day time for shorter exposures.
*Long exposures will always be placed at the end of a day to free up day time for shorter exposures.
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