Specific Process Knowledge/Lithography/EBeamLithography/JEOLRequest: Difference between revisions

Revision as of 09:22, 12 September 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,178 edits →Usage conditions ← Older edit		Revision as of 09:24, 12 September 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,178 edits →Usage conditions Newer edit →
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	*Previously there was a limit on the number of future bookings a user could have. There is no such defined limit any longer. We will of course not allow a single user to take up an unreasonable fraction of the time on the tool though.		*Previously there was a limit on the number of future bookings a user could have. There is no such defined limit any longer. We will of course not allow a single user to take up an unreasonable fraction of the time on the tool though.

			*Long exposure will always be placed at the end of a day to free up day time for shorter exposures.