Specific Process Knowledge/Lithography/EBeamLithography/JEOLRequest: Difference between revisions

Revision as of 09:19, 12 September 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,178 edits →Usage conditions ← Older edit		Revision as of 09:22, 12 September 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,178 edits →Usage conditions Newer edit →
Line 38:		Line 38:

	*'''Slot assignments are personal'''. The person requesting the exposure must also carry out the exposure. If there is a sudden need for a colaborating colleague to take over the exposure due to illness or similar you must notify the EBL staff. We must at all times know who is actually running the system.		*'''Slot assignments are personal'''. The person requesting the exposure must also carry out the exposure. If there is a sudden need for a colaborating colleague to take over the exposure due to illness or similar you must notify the EBL staff. We must at all times know who is actually running the system.

			*Previously there was a limit on the number of future bookings a user could have. There is no such defined limit any longer. We will of course not allow a single user to take up an unreasonable fraction of the time on the tool though.