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Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch: Difference between revisions

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<gallery caption="Recipe name: SiO2_res_10, Recipe no. 10+EM coils: C06445_02 coil_2500W, platen:300W, EM:02/30A, He/C4F8= 17.5, C4F8/H2=1, Pressure:8.8mTorr, C4F8:25.6sccm, He:448.7sccm, H2:25.6sccm, 3:56 min " perrow="5">
<gallery caption="Recipe name: SiO2_res_10, Recipe no. 10+EM coils: C06445_02 coil_2500W, platen:300W, EM:02/30A, He/C4F8= 17.5, C4F8/H2=1, Pressure:8.8mTorr, C4F8:25.6sccm, He:448.7sccm, H2:25.6sccm, 3:56 min " perrow="5">
File:C09936_05.jpg
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File:C09936_01.jpg
File:C09936_02.jpg
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File:C09936_05.jpg
</gallery>
</gallery>


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