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Specific Process Knowledge/Lithography/EBeamLithography/JEOLRequest: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
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*Slot assignments are personal. The person requesting the exposure must also carry out the exposure. If there is a sudden need for a colaborating colleague to take over the exposure due to illness or similar you must notify the EBL staff. We must at all times know who is actually running the system.
*Slot assignments are personal. The person requesting the exposure must also carry out the exposure. If there is a sudden need for a colaborating colleague to take over the exposure due to illness or similar you must notify the EBL staff. We must at all times know who is actually running the system.
=Request for exposure by Nanolab=
At a later point in time we will open up for a limited service where Nanolab will carry out exposures on behalf of users.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/JEOLRequest"