Specific Process Knowledge/Lithography/EBeamLithography/JEOLRequest: Difference between revisions
| Line 33: | Line 33: | ||
*Minor changes can be made to a job between submission and exposure. These changes may not affect execution time in any significant way. If you need to make significant changes to a job you must notify the EBL staff on the request email address. | *Minor changes can be made to a job between submission and exposure. These changes may not affect execution time in any significant way. If you need to make significant changes to a job you must notify the EBL staff on the request email address. | ||
*Slot assignments are personal. The person requesting the exposure must also carry out the exposure. If there is a sudden need for a colaborating colleague to take over the exposure due to illness or similar you must notify the EBL staff. We must at all times know who is actually running the system. | |||
=Request for exposure by Nanolab= | =Request for exposure by Nanolab= | ||
At a later point in time we will open up for a limited service where Nanolab will carry out exposures on behalf of users. | At a later point in time we will open up for a limited service where Nanolab will carry out exposures on behalf of users. | ||