Specific Process Knowledge/Lithography/EBeamLithography/JEOLRequest: Difference between revisions
| Line 33: | Line 33: | ||
*If your substrate for some reason can not be ready in time you must notify us on the request email as soon as possible. You can not change your job to something else without approval. | *If your substrate for some reason can not be ready in time you must notify us on the request email as soon as possible. You can not change your job to something else without approval. | ||
*Minor changes can be made to a job between submission and exposure. These changes may not affect execution time in any significant way. If you need to make significant changes to a job you must notify the EBL staff on the request email address. | |||
=Request for exposure by Nanolab= | =Request for exposure by Nanolab= | ||
At a later point in time we will open up for a limited service where Nanolab will carry out exposures on behalf of users. | At a later point in time we will open up for a limited service where Nanolab will carry out exposures on behalf of users. | ||