Specific Process Knowledge/Lithography/EBeamLithography/JEOLRequest: Difference between revisions
Created page with "=Request for user exposure slot= As of October 1st 2023 all exposure slots on the JEOL 9500 system are managed and delegated by the Nanolab EBL staff. In order to get an exposure slot users must request a slot by submitting a request form AND prepared job files for the exposure. The request form can be found here. Please send the request to JEOL-request@nanolab.dtu.dk. ==Request form guide== =Request for exposure by Nanolab= At a later point in time we will open u..." |
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=Request for user exposure slot= | =Request for user exposure slot= | ||
As of October 1st 2023 all exposure slots on the JEOL 9500 system are managed and delegated by the Nanolab EBL staff. In order to get an exposure slot users must request a slot by submitting a request form AND prepared job files for the exposure. | As of October 1st 2023 all exposure slots on the JEOL 9500 system are managed and delegated by the Nanolab EBL staff. In order to get an exposure slot users must request a slot by submitting a request form AND prepared job files for the exposure. The EBL staff will then assign a user a slot of an appropriate length for the exposure. We will try and group exposure jobs together to minimize cassette changes by loading multiple substrates in a single cassette whenever possible. | ||
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==Request form guide== | ==Request form guide== | ||
=Request for exposure by Nanolab= | =Request for exposure by Nanolab= | ||
At a later point in time we will open up for a limited service where Nanolab will carry out exposures on behalf of users. | At a later point in time we will open up for a limited service where Nanolab will carry out exposures on behalf of users. | ||