Specific Process Knowledge/Lithography/EBeamLithography/JEOLRequest: Difference between revisions
Created page with "=Request for user exposure slot= As of October 1st 2023 all exposure slots on the JEOL 9500 system are managed and delegated by the Nanolab EBL staff. In order to get an exposure slot users must request a slot by submitting a request form AND prepared job files for the exposure. The request form can be found here. Please send the request to JEOL-request@nanolab.dtu.dk. ==Request form guide== =Request for exposure by Nanolab= At a later point in time we will open u..." |
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=Request for user exposure slot= | =Request for user exposure slot= | ||
As of October 1st 2023 all exposure slots on the JEOL 9500 system are managed and delegated by the Nanolab EBL staff. In order to get an exposure slot users must request a slot by submitting a request form AND prepared job files for the exposure. | As of October 1st 2023 all exposure slots on the JEOL 9500 system are managed and delegated by the Nanolab EBL staff. In order to get an exposure slot users must request a slot by submitting a request form AND prepared job files for the exposure. The EBL staff will then assign a user a slot of an appropriate length for the exposure. We will try and group exposure jobs together to minimize cassette changes by loading multiple substrates in a single cassette whenever possible. | ||
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==Request form guide== | ==Request form guide== | ||
=Request for exposure by Nanolab= | =Request for exposure by Nanolab= | ||
At a later point in time we will open up for a limited service where Nanolab will carry out exposures on behalf of users. | At a later point in time we will open up for a limited service where Nanolab will carry out exposures on behalf of users. |
Revision as of 08:54, 8 September 2023
Request for user exposure slot
As of October 1st 2023 all exposure slots on the JEOL 9500 system are managed and delegated by the Nanolab EBL staff. In order to get an exposure slot users must request a slot by submitting a request form AND prepared job files for the exposure. The EBL staff will then assign a user a slot of an appropriate length for the exposure. We will try and group exposure jobs together to minimize cassette changes by loading multiple substrates in a single cassette whenever possible.
The request form can be found here. Please send the request to JEOL-request@nanolab.dtu.dk.
Request form guide
Request for exposure by Nanolab
At a later point in time we will open up for a limited service where Nanolab will carry out exposures on behalf of users.