Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
| Line 59: | Line 59: | ||
When the exposure is started on the maskless aligner, the software starts converting the design to the image files needed for the exposure. When sufficient data has been generated, the hardware starts exposing the sample, while more image data is being generated in the background. This simultaneous data conversion and exposure is called Online conversion. Once a design has been converted (and/or exposed) the data may be reused for repeated exposures. Due to no time lost waiting for data conversion, offline exposure may be several tens of % faster than online. However, the converted data can only be reused if no alignment is needed, including flat alignment ("Expose with substrate angle"/"Expose with Global Angle"). | When the exposure is started on the maskless aligner, the software starts converting the design to the image files needed for the exposure. When sufficient data has been generated, the hardware starts exposing the sample, while more image data is being generated in the background. This simultaneous data conversion and exposure is called Online conversion. Once a design has been converted (and/or exposed) the data may be reused for repeated exposures. Due to no time lost waiting for data conversion, offline exposure may be several tens of % faster than online. However, the converted data can only be reused if no alignment is needed, including flat alignment ("Expose with substrate angle"/"Expose with Global Angle"). | ||
<br clear="all" /> | |||
[[File:Speed vs area newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm, 100 mJ/cm<sup>2</sup>) as function of the exposure area.]] | [[File:Speed vs area newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm, 100 mJ/cm<sup>2</sup>) as function of the exposure area.]] | ||