Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions
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==Writing speed== | ==Writing speed== | ||
(This section was updated 05-09-2023 by taran@nanolab) | |||
According to specs (after being converted to write mode 2), the writing speed of Aligner: Maskless 02 is 500 mm<sup>2</sup>/min in fast mode. Using the high quality exposure mode cuts this speed by 2.5, to approximately 200 mm<sup>2</sup>/min. The writing speed for a 100x100 mm<sup>2</sup> area measured after being modified to write mode 2 tool (2023-03-21) of the machine was ~1200 mm<sup>2</sup>/min at 100 mJ/cm<sup>2</sup>. | According to specs (after being converted to write mode 2), the writing speed of Aligner: Maskless 02 is 500 mm<sup>2</sup>/min in fast mode. Using the high quality exposure mode cuts this speed by 2.5, to approximately 200 mm<sup>2</sup>/min. The writing speed for a 100x100 mm<sup>2</sup> area measured after being modified to write mode 2 tool (2023-03-21) of the machine was ~1200 mm<sup>2</sup>/min at 100 mJ/cm<sup>2</sup>. | ||
[[File:Speed vs area newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm) as function of the exposure area]] | [[File:Speed vs area newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm, 100 mJ/cm<sup>2</sup>) as function of the exposure area]] | ||
'''Speed vs. area:''' | '''Speed vs. area:''' | ||
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[[File:Speed vs dose newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm) as function of the exposure dose. The | [[File:Speed vs dose newWritehead.png|640px|thumb|The writing speed of Aligner: Maskless 02 (fast mode, 375nm) as function of the exposure dose. The exposure speed was measured using a 10 mm x 100 mm exposure area, but should be approximately the same for a full 100 mm wafers exposure.]] | ||
'''Speed vs. dose:''' | '''Speed vs. dose:''' | ||