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| | ===Current EBL resist stock=== |
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| {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%" | | {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%" |
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| !colspan="4" border="none" style="background:silver; color:black;" align="center"|Current EBL resist stock in E4 | | !colspan="4" border="none" style="background:silver; color:black;" align="center"|Current EBL resist stock in E4 (updated 2023-09-04) |
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| |-style="background:WhiteSmoke; color:black" | | |-style="background:WhiteSmoke; color:black" |
| |'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR AR-P 6200]]'''
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| |Positive
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| |[http://www.allresist.com AllResist]
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| |[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P6200_CSAR62english_Allresist_product-information.pdf AR-P 6200 info]
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| |[[Specific_Process_Knowledge/Lithography/Coaters#Spin Coater: Gamma E-beam and UV|Spin Coater: Gamma E-beam and UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]]
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| |a = 7252.2, b = -0.454
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| |Anisole
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| *AR-600-546
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| *AR-600-548
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| *N50
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| *MIBK:IPA
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| |IPA
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| *AR-600-71
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| *Remover 1165
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| |[[media:Process_Flow_CSAR.docx|CSAR]] <br> [[media:Process Flow CSAR with Al.docx|CSAR with Al]] <br> [[media:Process_Flow_LOR5A_CSAR_Developer_TMAH_Manual.docx|LOR5A with CSAR]] <br>
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| |- | | |AR-P 6200.04 |
| |-style="background:LightGrey; color:black"
| | |1L |
| |'''[[Specific_Process_Knowledge/Lithography/ARN8200|Medusa AR-N 8200]]'''
| | | 2026 |
| |Negative
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| |[http://www.allresist.com AllResist]
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| |[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/SXAR-N8200-1_english_Allresist_product_information.pdf AR-N 8200 info]
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| |[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]]
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| |a = ?, b = ?
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| |AR 600-07
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| |AR 300-47:DIW (1:1)
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| |DIW | |
| |BOE
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| |-
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| |-style="background:LightGrey; color:black"
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| |'''[[Specific_Process_Knowledge/Lithography/ARN7500|AR-N 7500]]'''
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| |Negative
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| |[http://www.allresist.com AllResist]
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| |[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-N7500_english_Allresist_product-information.pdf AR-N 7500 info]
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| |[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]]
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| |a = 17126, b = -0.435
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| |PGMEA
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| *AR 300-47:DIW (4:1)
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| *MIF726:DIW (8:5)
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| |DIW
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| *AR 300-73
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| *O2 plasma
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| |} | | |} |
