Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 143: Line 143:


===Fracture===
===Fracture===
Before pattern writing the polygons of a design must be fractured into trapezoids filled with beam/shot positions. Careful setup of how a design is fractured and shots are placed can greatly enhance the end result both in terms of critical dimension accuracy, line edge roughness and pattern stitching between writing fields. The ''Fracture'' node has three main panes, ''General'', ''Advanced'' and ''Fields'' (if using ''Flat with Fields'').  
The ''Fracture'' node has changed considerably between Beamer 6 and Beamer 7. In Beamer 7 all features related to field placement has been moved into a new ''Field'' node. To gain the same functionality as in Beamer 6 simply put a ''Field'' node after the ''Fracture'' node in Beamer 7.
 
Before pattern writing the shapes/polygons of a design must be fractured into trapezoids filled with beam/shot positions. Careful setup of how a design is fractured and shots are placed can greatly enhance the end result both in terms of critical dimension accuracy, line edge roughness and pattern stitching between writing fields.




{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
|-
|-
| [[image:BEAMER_F1.png|300px]]
| [[image:BEAMER7_Fracture.png|400px]]
|-  
|-  
| colspan="3" style="text-align:center;|
| colspan="3" style="text-align:center;|
The ''General'' pane of the ''Fracture'' node.
The ''Fracture'' node in Beamer.
|}
|}


The options found on the ''General'' pane are:


''Maintain grid:'' Check this to fracture at the database grid size, in most cases 1 nm. If unchecked the fracturing resolution can be changed in the ''Resolution'' field. The fracture resolutions should be set to the writing grid resolution, in most cases 1 nm.
''Maintain grid:'' Check this to fracture at the database grid size, in most cases 1 nm. If unchecked the fracturing resolution can be changed in the ''Resolution'' field. The fracture resolutions should be set to the writing grid resolution, in most cases 1 nm.
Line 164: Line 164:
*''Hierarchical:'' This mode will preserve the hierarchical layout structure.  
*''Hierarchical:'' This mode will preserve the hierarchical layout structure.  
*''Flat:'' This mode will remove the hierarchy in the pattern while preserving the layer information of the shapes.
*''Flat:'' This mode will remove the hierarchy in the pattern while preserving the layer information of the shapes.
*''Flat with Fields:'' This mode will enable the use of the the Fields tab. By flattening the pattern with fields, the original hierarchy is removed and replaced with a hierarchy where the virtual fields are the cells that make up the pattern. The maximum size of each cell is the size of a field, which can be controlled in the Field tab.


''Fracturing mode'' determines the method used for fracturing.
''Fracturing mode'' determines the method used for fracturing.
Line 170: Line 169:
*''Large Rectangle Fine Trapezoid:'' The LRFT algorithm attempts to minimize the number of shapes using very large rectangles for large areas and fine trapezoids for smaller features. In other words, this mode fractures the polygons with as many large rectangles as possible and completes the filling with small trapezoids.
*''Large Rectangle Fine Trapezoid:'' The LRFT algorithm attempts to minimize the number of shapes using very large rectangles for large areas and fine trapezoids for smaller features. In other words, this mode fractures the polygons with as many large rectangles as possible and completes the filling with small trapezoids.
*''Curved:'' This algorithm should typically be used to fracture circles and rings. This mode allows BEAMER to shift the vertices along curves to get fractures consistent with the specified resolution and beam step size. In other words, this mode will try to detect curves in the given polygons and fracture these curves within a specified tolerance consistent with the specified resolution and beam step size.
*''Curved:'' This algorithm should typically be used to fracture circles and rings. This mode allows BEAMER to shift the vertices along curves to get fractures consistent with the specified resolution and beam step size. In other words, this mode will try to detect curves in the given polygons and fracture these curves within a specified tolerance consistent with the specified resolution and beam step size.
*''Symmetric Fracturing:'' This will attempt to perserve as high symmetry across the x- and y-axis as possible.
*''Symmetric Fracturing:'' This will attempt to perserve as high symmetry across the x- and y-axis as possible.
*''Subfield Fracturing:'' Will force any fracture field to be smaller or equal to the subfield size. The subfield size is controlled on the ''Fields'' pane and on the JEOL 9500 system the maximum subfield size is 4 µm.
''Interactive Resorting of Fields:'' This will allow the user to manually determine the field writing order.




Line 183: Line 180:
Illustration of the three different fracture modes on a 400 nm diameter circle. From left to right the fracture modes are ''Conventional'', ''LRFT'' and ''Curved''.
Illustration of the three different fracture modes on a 400 nm diameter circle. From left to right the fracture modes are ''Conventional'', ''LRFT'' and ''Curved''.
|}
|}
===Fields===




Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER"