Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/Nitride Etch: Difference between revisions
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===Etch rate uniformity=== | ===Etch rate uniformity=== | ||
<gallery caption="SRN etch uniformity with recipes optimized for SiO2 etching " perrow="2"> | <gallery caption="SRN etch uniformity with recipes optimized for SiO2 etching" widths="400px" heights="250px" perrow="2"> | ||
File:SRN etch uniformity DOE2_Post_II_21.jpg | File:SRN etch uniformity DOE2_Post_II_21.jpg | ||
File:SRN etch uniformity SiO2_res_10.jpg | File:SRN etch uniformity SiO2_res_10.jpg | ||
</gallery> | </gallery> | ||