Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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''Multipass Mode:'' In order to mitigate beam fluctations it is possible to divide an exposure into multiple exposures of each writing field. It is a simple averaging technique whare each pattern element is written n times, each time with 1/n of the total dose. Options are ''Single Pass'', ''Two Passes'', ''Four Passes'' and ''Dose Selective''. In the first three cases the pattern is written in either one pass (i.e. not multipass), two passes or four passes. In the dose selective approach it is possible to set the number of passes based on the dose using the table in the bottom of the window. When using multipass one must assign either a ''Mainfield Offset'', a ''Subfield Offset'' or both, such that elements are written at different placements of the writing field. | ''Multipass Mode:'' In order to mitigate beam fluctations it is possible to divide an exposure into multiple exposures of each writing field. It is a simple averaging technique whare each pattern element is written n times, each time with 1/n of the total dose. Options are ''Single Pass'', ''Two Passes'', ''Four Passes'' and ''Dose Selective''. In the first three cases the pattern is written in either one pass (i.e. not multipass), two passes or four passes. In the dose selective approach it is possible to set the number of passes based on the dose using the table in the bottom of the window. When using multipass one must assign either a ''Mainfield Offset'', a ''Subfield Offset'' or both, such that elements are written at different placements of the writing field. | ||
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