Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

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 ''Overlap Method:'' Allows one to setup a pattern overlap between main fields to mitigate stiching problems. The overlap dimension is controlled with the ''Size'' fields. The methods available are:
-''Share between fields:''
+''Share between fields:'' This method divides pattern elements at main field boundaries and assigns the entire dose of an element to a single writing field. An overlap region can be defined such that small elements within this overlap are placed in a single writing field to avoid stitching.
 ''Split Dose between Fields:''
 ''Interleaving:''
 ''Interleaving + extra field:''
+{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
+|-
+| [[image:BEAMER_Share1.png|300px]] | [[image:BEAMER_Share2.png|300px]]
+|-
+| colspan="2" style="text-align:center;|
+Illustration of the three different fracture modes on a 400 nm diameter circle. From left to right the fracture modes are ''Conventional'', ''LRFT'' and ''Curved''.
+|}