Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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''Maintain grid:'' Check this to fracture at the database grid size, in most cases 1 nm. If unchecked the fracturing resolution can be changed in the ''Resolution'' field. The fracture resolutions should be set to the writing grid resolution, in most cases 1 nm. | ''Maintain grid:'' Check this to fracture at the database grid size, in most cases 1 nm. If unchecked the fracturing resolution can be changed in the ''Resolution'' field. The fracture resolutions should be set to the writing grid resolution, in most cases 1 nm. | ||
''Beam Step Size Correction:'' | ''Beam Step Size Correction:'' If checked, the program will attempt to preserve original shape outlines when beam shots are placed. | ||
''Fracturing Type:'' | |||
*''Hierarchical:'' This mode will preserve the hierarchical layout structure. | |||
*''Flat:'' This mode will remove the hierarchy in the pattern while preserving the layer information of the shapes. | |||
*''Flat with Fields:'' This mode will enable the use of the the Fields tab. By flattening the pattern with fields, the original hierarchy is removed and replaced with a hierarchy where the virtual fields are the cells that make up the pattern. The maximum size of each cell is the size of a field, which can be controlled in the Field tab. | |||
''Fracturing mode'' determines the method used for fracturing. | ''Fracturing mode'' determines the method used for fracturing. | ||