Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

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 | Add a PEC-module on top of the import module. A Proximity Error Correction parameter window opens. Here, you can either type in values of alpha, beta and eta or load a point spread function.|| After converting to v30-format, the dose variation is illustrated in your pattern || BEAMER has at this point created a jdi-file in the same folder as the v30-file. This jdi-file is the shot modulation that should be inserted in the jdf-file. The jdi-file opens with SuperEdi.
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-= Bulk and sleeve =
-If you have structures with both bulky and fine parts that you wish to pattern either with different doses or different currents, you can use BEAMER to divide the structures in different layers or different v30-files.
-{| cellpadding="2" style="border: 2px solid darkgray;" align="right"
-! width="400" |
-! width="400" |
-|- border="0"
-|[[File:beamer8.jpg|400px|left]]
-|[[File:beamer9.jpg|400px|center]]
-|- align="center"
-| An illustration of how the 'bulk & sleeves' technique this is done by using the Bias and Minus modules; the Bias function subtracts in this case 1 micron from the pattern, defining layer 0 (red layer). Layer 1 (green) is the original pattern minus layer 0. ||In the flow to the left, the two layers are exported separately in two different v30-files. In the flow to the right, the two layers are combined in one single v30-file
 |}
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