Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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===Export | ===Export=== | ||
The export node will export the pattern data to the machine specific format. For exposure on JEOL 9500 export to V30. For exposure on Raith E-line export to Raith EBL File (GDS). Export to V30 has multiple options distributed on the three main panes, ''General'', ''Advanced'' and ''Multipass'', while export to Raith GDS has almost no export options. | The export node will export the pattern data to the machine specific format. For exposure on JEOL 9500 export to V30. For exposure on Raith E-line export to Raith EBL File (GDS). Export to V30 has multiple options distributed on the three main panes, ''General'', ''Advanced'' and ''Multipass'', while export to Raith GDS has almost no export options. | ||