Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
| Line 4: | Line 4: | ||
All users of the JEOL 9500 system must have their pattern converted to the JEOL52 V3.0 (V30) format, this conversion is done using Beamer. Beamer can however do many other operations than this simple format conversion. Proper pattern processen in Beamer can significantly enhance the quality of the lithographical result from an EBL process. As a minimum users should become familar with PEC. In this section we will describe some of the most frequently used nodes and also provide a few node setups for specialized tasks. | All users of the JEOL 9500 system must have their pattern converted to the JEOL52 V3.0 (V30) format, this conversion is done using Beamer. Beamer can however do many other operations than this simple format conversion. Proper pattern processen in Beamer can significantly enhance the quality of the lithographical result from an EBL process. As a minimum users should become familar with PEC. In this section we will describe some of the most frequently used nodes and also provide a few node setups for specialized tasks. | ||
== | ==Beamer nodes== | ||
A quick overview of the Beamer nodes is provided in the table below. The main nodes are described in further detail below. | A quick overview of the Beamer nodes is provided in the table below. The main nodes are described in further detail below. | ||