Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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! Module/method !! Short description | ! Module/method !! Short description | ||
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| Import || | | Import || Layout import | ||
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| Export || | | Export || Export to V30 and JDI | ||
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| Edit || | | Edit || Opens the pattern in LayoutEditor | ||
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| Heal || | | Heal || Used to remove pattern overlaps | ||
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| Transform || | | Transform || Used to rotate, scale or shift patterns | ||
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| Bias || | | Bias || Used to grow or shrink patterns | ||
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| AND, OR, MINUS, XOR, P-XOR, NOT || | | AND, OR, MINUS, XOR, P-XOR, NOT || Applies a boolean operation to two inputs | ||
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| Extract || | | Extract || Used to extract layers or regions of a design | ||
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| Replace || | | Replace || Used to replace a cell in the design with a cell from another design | ||
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| Merge || | | Merge || Merges multiple patterns into one | ||
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| Grid || | | Grid || | ||