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Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

Thope (talk | contribs)
Thope (talk | contribs)
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! Module/method !! Short description
! Module/method !! Short description
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| Import || Used to import a layout
| Import || Layout import
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| Export || x
| Export || Export to V30 and JDI
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| Edit || x
| Edit || Opens the pattern in LayoutEditor
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| Heal || x
| Heal || Used to remove pattern overlaps
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| Transform || x
| Transform || Used to rotate, scale or shift patterns
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| Bias || x
| Bias || Used to grow or shrink patterns
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| AND, OR, MINUS, XOR, P-XOR, NOT || x
| AND, OR, MINUS, XOR, P-XOR, NOT || Applies a boolean operation to two inputs
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| Extract || x
| Extract || Used to extract layers or regions of a design
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| Replace ||  
| Replace || Used to replace a cell in the design with a cell from another design
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| Merge ||  
| Merge || Merges multiple patterns into one
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| Grid ||  
| Grid ||