Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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| Transform || x | | Transform || x | ||
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| Bias || x | | Bias || x | ||
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| AND, OR, MINUS, XOR, P-XOR, NOT || x | | AND, OR, MINUS, XOR, P-XOR, NOT || x | ||
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| Extract || x | | Extract || x | ||
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| Replace || | | Replace || | ||
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| Merge || | | Merge || | ||
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| Grid || | | Grid || | ||
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| Mapping || | | Mapping || | ||
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| Filter || | | Filter || | ||
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| Fracture || | | Fracture || | ||
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| ChipPlace || Graphical interface to set up arrays of patterns and assign dose to each element, excellent for dose testing | | ChipPlace || Graphical interface to set up arrays of patterns and assign dose to each element, excellent for dose testing | ||
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| Visual-Job || | | Visual-Job || | ||
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| PEC || Used to apply Proximity Effect Correction to a pattern | | PEC || Used to apply Proximity Effect Correction to a pattern | ||
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