Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions
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*Sample: s007592 ''by bghe@nanolab (2015-06-02)'' | *Sample: s007592 ''by bghe@nanolab (2015-06-02)'' | ||
*See Martin Lind Ommen's results with hard masks: [https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/Etching_of_Silicon_Oxide# | *See Martin Lind Ommen's results with hard masks: [https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/Etching_of_Silicon_Oxide#Dry_etch_with_Hard_mask] <br> There were problems with polymer on the surface after etching. | ||
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