Specific Process Knowledge/Characterization/SEM Gemini 1: Difference between revisions
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[[image:LA_SEM_Supra_1.jpg|400x400px|right|thumb|The SEM | [[image:LA_SEM_Supra_1.jpg|400x400px|right|thumb|The SEM Gemini 1 being installed in the cleanroom.{{photo1}} ]] | ||
====DTU Nanolab news August 2023==== | |||
===DTU Nanolab introduces next-generation SEM in the cleanroom=== | |||
Right now, we are installing a new field emission scanning electron microscope (FE-SEM) in the B-section of the cleanroom. It is a state-of-the-art GeminiSEM 560 with the new Gemini 3 column from Carl Zeiss. | |||
The tool is next-generation compared to our present three about 10 years old Supra-40/60 SEM’s (also from Carl Zeiss). We are looking forward to offer our users access to all the new features provided by this tool, a.o.: | |||
<b>Detectors:</b> | |||
* SE2: Chamber mounted secondary electron (SE) detector | |||
* In-lens SE: In-column high resolution SE detector | |||
* In-lens EsB: In-column highly sensitive backscatter electron (BSE) detector for obtaining good material contrast | |||
* aBSD: Retractable column mounted solid state BSE detector with six sectors for detection of energy and angle selective backscattered electrons, i.e. for obtaining both material and topographical contrast | |||
* VPSE: Variable pressure (VP) light detector for SE signal detecting | |||
* aSTEM: Retractable solid state STEM detector with five sectors enabling bright field and both annular and oriented dark-field transmission electron imaging | |||
<b>Dramatically improved performance on insulating samples achieved via two pathways:</b> | |||
* Latest generation column design that takes low kV imaging to the next level | |||
* Sophisticated low vacuum modes for charge compensation: | |||
* Standard variable pressure (VP) | |||
* NanoVP: A retractable differential pumping aperture mounted on the column makes it possible to use the In-lens SE and ESB detectors in VP mode | |||
<b>Other features:</b> | |||
* Installed on an actively damped anti-vibration platform and with magnetic field cancellation system to protect it from external sources of noise | |||
* Sample bias option and dedicated sample holders | |||
* Plasma cleaner for in-situ sample and chamber cleaning | |||
* Sample loading trough a load lock or the chamber door | |||
* Load lock mounted camera for easy sample navigation | |||
* Several new automated features | |||
We will spend the coming weeks on the installation and acceptance tests of the tool and prepare the training protocol. | |||
We hope that you will receive the tool well when we release it, which we expect to do in September. | |||
The image shows a freshly cleaved cross section of a mulilayered thin film of alternating layers of 5 nm TiO2 and 5 nm Al2O3 deposited by ALD. | |||