Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142: Difference between revisions
| Line 81: | Line 81: | ||
|} | |} | ||
==Etching SRN (Silicon Rich Nitride) with nano1.42== | |||
''This test has been done by Leonid Beliaev'' <br> | ''This test has been done by Leonid Beliaev'' <br> | ||
*274nm SRN by LPCVD ("6 inch LS" recipe) | *274nm SRN by LPCVD ("6 inch LS" recipe) | ||