Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium: Difference between revisions
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The SEM images where done after both the Cr etch and the silicon nitride etch in the AOE using the recipe " | The SEM images where done after both the Cr etch and the silicon nitride etch in the AOE using the recipe "SiN_AS". The important thing was to see how well the Cr works for masking the nitride given vertical and smooth sidewalls in the nitride. The thickness of the Cr was 40 nm | ||
{| class="wikitable" | {| class="wikitable" | ||