Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
| Line 81: | Line 81: | ||
|style="background:WhiteSmoke; color:black;" align="center"| | |style="background:WhiteSmoke; color:black;" align="center"| | ||
|- | |- | ||
!style="background:Silver; color:black" align="center" align="center" rowspan="3"|Process time | !style="background:Silver; color:black" align="center" align="center" rowspan="3"|Process time | ||
|style="background:Silver; color:black"|At 1200 <sup>o</sup>C | |style="background:Silver; color:black"|At 1200 <sup>o</sup>C | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
| Line 126: | Line 126: | ||
[[File:PlotAnnealsys.png|650px|thumb|center| Graphic representation of the recommended annealing duration in respect to the annealing temperature. Image: Inês Diogo@DTU Nanolab, July 2023]] | |||
==Previous work on RTP Annealsys== | ==Previous work on RTP Annealsys== | ||