Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
| Line 490: | Line 490: | ||
|-style="background:silver; color:black" | |-style="background:silver; color:black" | ||
!AZ 5214E<br>image reversal | !AZ 5214E<br>image reversal | ||
| 2023-04-05<br>jehem | | <span style="color:red">2023-04-05</span><br>jehem | ||
| 2.2 µm | | 2.2 µm | ||
| Fast | | Fast | ||
| Line 502: | Line 502: | ||
|-style="background:whitesmoke; color:black" | |-style="background:whitesmoke; color:black" | ||
!AZ 4562 | !AZ 4562 | ||
| 2023-04-05<br>jehem | | <span style="color:red">2023-04-05</span><br>jehem | ||
| 10 µm | | 10 µm | ||
| Fast | | Fast | ||