Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride: Difference between revisions
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The LPCVD nitride has a very good step coverage, and the film thickness is very uniform over the wafers. | The LPCVD nitride has a very good step coverage, and the film thickness is very uniform over the wafers. | ||
'''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:''' | '''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:''' | ||
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=84 4" LPCVD nitride furnace (B2)] | [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=84 4" LPCVD nitride furnace (B2)] | ||
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=250 6" LPCVD nitride furnace (E3)] | [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=250 6" LPCVD nitride furnace (E3)] | ||
[https://labmanager.dtu.dk/function.php?module=MiscDocument&view=docs&page_id=387 Furnace computer manual] | |||