Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Masks: Difference between revisions
New page: ; Question 1 : I remember you said that you don't like Al as masking material because it will get sputtered off (am I right?) - but what about ALD deposited aluminium oxide - it is, as fa... |
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; Question 1 | ; Question 1 | ||
: I remember you said that you don't like Al as masking material because it will get sputtered off (am I | : I remember you said that you don't like Al as masking material because it will get sputtered off (am I right?) - but what about ALD deposited aluminium oxide - it is, as far as I know, much harder and resistant than Al..? | ||
right?) - but what about ALD deposited aluminium oxide - it is, as far as I know, much harder and resistant | |||
than Al..? | |||
;Answer 1 | ;Answer 1 | ||
: We don't have experience with ALD deposited aluminium oxide as a mask, however for some ESC | : We don't have experience with ALD deposited aluminium oxide as a mask, however for some ESC configurations we have seen evidence of sputtering of the alumina uniformity shield surrounding the wafer; this would lead me to believe that the ALD aluminium oxide could still sputter and cause contamination issues. | ||
configurations we have seen evidence of sputtering of the alumina uniformity shield surrounding the wafer; | |||
this would lead me to believe that the ALD aluminium oxide could still sputter and cause contamination | |||
issues. |
Revision as of 09:59, 25 February 2011
- Question 1
- I remember you said that you don't like Al as masking material because it will get sputtered off (am I right?) - but what about ALD deposited aluminium oxide - it is, as far as I know, much harder and resistant than Al..?
- Answer 1
- We don't have experience with ALD deposited aluminium oxide as a mask, however for some ESC configurations we have seen evidence of sputtering of the alumina uniformity shield surrounding the wafer; this would lead me to believe that the ALD aluminium oxide could still sputter and cause contamination issues.