Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Masks: Difference between revisions

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New page: ; Question 1 : I remember you said that you don't like Al as masking material because it will get sputtered off (am I right?) - but what about ALD deposited aluminium oxide - it is, as fa...
 
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; Question 1
; Question 1
: I remember you said that you don't like Al as masking material because it will get sputtered off (am I  
: I remember you said that you don't like Al as masking material because it will get sputtered off (am I right?) - but what about ALD deposited aluminium oxide - it is, as far as I know, much harder and resistant than Al..?
right?) - but what about ALD deposited aluminium oxide - it is, as far as I know, much harder and resistant  
than Al..?


;Answer 1
;Answer 1
: We don't have experience with ALD deposited aluminium oxide as a mask, however for some ESC  
: We don't have experience with ALD deposited aluminium oxide as a mask, however for some ESC configurations we have seen evidence of sputtering of the alumina uniformity shield surrounding the wafer; this would lead me to believe that the ALD aluminium oxide could still sputter and cause contamination issues.
configurations we have seen evidence of sputtering of the alumina uniformity shield surrounding the wafer;  
this would lead me to believe that the ALD aluminium oxide could still sputter and cause contamination  
issues.

Revision as of 09:59, 25 February 2011

Question 1
I remember you said that you don't like Al as masking material because it will get sputtered off (am I right?) - but what about ALD deposited aluminium oxide - it is, as far as I know, much harder and resistant than Al..?
Answer 1
We don't have experience with ALD deposited aluminium oxide as a mask, however for some ESC configurations we have seen evidence of sputtering of the alumina uniformity shield surrounding the wafer; this would lead me to believe that the ALD aluminium oxide could still sputter and cause contamination issues.