Specific Process Knowledge/Etch/KOH Etch: Difference between revisions
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|style="background:LightGrey; color:black"|Etch rates in PECVD SiN | |style="background:LightGrey; color:black"|Etch rates in PECVD SiN | ||
|style="background:WhiteSmoke; color:black"|[[https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_PECVD/PECVD3:_Low_stress_nitride_testing# | |style="background:WhiteSmoke; color:black"|[[https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_PECVD/PECVD3:_Low_stress_nitride_testing#DOE_made_to_find_a_good_QC_nitride_recipe_with_low_stress_and_low_KOH_etch_rate_(''by Berit Herstrøm @ DTU Nanolab 2016 Marts'')]] | ||
|style="background:WhiteSmoke; color:black"|See etchrates for PECVD SiN [[https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_PECVD/PECVD3:_Low_stress_nitride_testing here]] | |style="background:WhiteSmoke; color:black"|See etchrates for PECVD SiN [[https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_PECVD/PECVD3:_Low_stress_nitride_testing here]] | ||
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