Specific Process Knowledge/Etch/DRIE-Pegasus/FAQ/Matching: Difference between revisions
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= Question 1= | === Question 1=== | ||
Last Friday I ran the first nanoetches with the recipe below - with limited success however. I was short on | Last Friday I ran the first nanoetches with the recipe below - with limited success however. I was short on | ||
time so I couldn't investigate it further but for some reason the coil power would rise to some 1500 W in the | time so I couldn't investigate it further but for some reason the coil power would rise to some 1500 W in the | ||
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as starting points?) and I don't need to strike the plasma...? | as starting points?) and I don't need to strike the plasma...? | ||
=== Answer 1 === | |||
''It is odd that the power delivery went up to 1500W when the demand was 800W. It sounds like the | |||
matching needs to be looked at more closely. Careful set up of the starting positions will be needed; these | matching needs to be looked at more closely. Careful set up of the starting positions will be needed; these | ||
will likely be different to what has worked before in any other recipe as the conditions for this process are | will likely be different to what has worked before in any other recipe as the conditions for this process are | ||
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Load set to start in the sweet spot position and Tune set 5% below | Load set to start in the sweet spot position and Tune set 5% below | ||
4mT is a difficult pressure to strike at so it may be necessary to use the strike pressure anyway; only 3s of | 4mT is a difficult pressure to strike at so it may be necessary to use the strike pressure anyway; only 3s of | ||
plasma in 10-20mT strike pressure range should have little-to-no effect on the process result. | plasma in 10-20mT strike pressure range should have little-to-no effect on the process result.'' | ||