Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
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|style="background:LightGrey; color:black"|Gas flows | |style="background:LightGrey; color:black"|Gas flows | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*SiH<sub>4</sub>:0- | *SiH<sub>4</sub>:0-180 sccm | ||
*N<sub>2</sub>O:0-3000 sccm | *N<sub>2</sub>O:0-3000 sccm | ||
*NH<sub>3</sub>:0-1000 sccm | *NH<sub>3</sub>:0-1000 sccm | ||