Specific Process Knowledge/Thin film deposition: Difference between revisions
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| align="left" valign="top" style="background:LightGray"|''' PVD''' | | align="left" valign="top" style="background:LightGray"|''' PVD - Physical vapor deposition''' | ||
| align="left" valign="top" style="background:#DCDCDC;"|''' LPCVD''' | | align="left" valign="top" style="background:#DCDCDC;"|''' LPCVD - low pressure chemical vapor deposition''' | ||
| align="left" valign="top" style="background:LightGray"|''' PECVD''' | | align="left" valign="top" style="background:LightGray"|''' PECVD - plasma enhanced chemical vapor deposition''' | ||
| align="left" valign="top" style="background:#DCDCDC;"|''' ALD''' | | align="left" valign="top" style="background:#DCDCDC;"|''' ALD - atomic layer deposition''' | ||
| align="left" valign="top" style="background:LightGray"|''' Coaters''' | | align="left" valign="top" style="background:LightGray"|''' Coaters - for polymers''' | ||
| align="left" valign="top" style="background:#DCDCDC;"|''' Others''' | | align="left" valign="top" style="background:#DCDCDC;"|''' Others''' | ||
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*[[/PECVD|PECVD]] - ''Plasma Enhanced Chemical Vapor deposition'' | *[[/PECVD|PECVD]] - ''Plasma Enhanced Chemical Vapor deposition'' | ||
*[[/DiamondCVD|Seki Diamond CVD]] - ''Microwave Plasma CVD for diamond Growth'' | *[[/DiamondCVD|Seki Diamond CVD]] - ''Microwave Plasma CVD for diamond Growth'' | ||
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*[[/MVD|MVD]] - ''Molecular Vapor Deposition'' | *[[/MVD|MVD]] - ''Molecular Vapor Deposition'' | ||
*[[/Electroplating-Ni|Electroplating-Ni]] - ''Electrochemical deposition of nickel'' | *[[/Electroplating-Ni|Electroplating-Ni]] - ''Electrochemical deposition of nickel'' | ||
* | *Electroplating of Cu, Au, etc. - ''Ask in the department of Mechanical Engineering'' | ||
*MOCVD - Epitaxial growth - ''Ask the department of photonics if you are interested: [mailto:esem@fotonik.dtu.dk Elizaveta Semenova] or [mailto:kryv@fotonok.dtu.dk Kresten Yvind]'' | *MOCVD - Epitaxial growth - ''Ask the department of photonics if you are interested: [mailto:esem@fotonik.dtu.dk Elizaveta Semenova] or [mailto:kryv@fotonok.dtu.dk Kresten Yvind]'' | ||
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Revision as of 13:21, 23 May 2023
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Choose material to deposit
| Semiconductors | Oxides | Nitrides | Carbon and Carbides | Metals | Alloys | Transparent conductive oxides | Polymers | Multilayers |
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Aluminium Oxide (Al2O3)
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Silicon Nitride - and oxynitride
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Carbon
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Aluminium
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AlCu And an electroceramic: YSZ (Yttrium stabilized zirconia) |
ITO (Tin doped Indium Oxide) |
SU-8 |
Oh no! My material is not on the list! Please contact the Thin Film group if you would like to inquire about a material that is not mentioned here.
Choose deposition equipment
| PVD - Physical vapor deposition | LPCVD - low pressure chemical vapor deposition | PECVD - plasma enhanced chemical vapor deposition | ALD - atomic layer deposition | Coaters - for polymers | Others
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See the Lithography/Coaters page for coating polymers |
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