Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/OldConfig: Difference between revisions
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* C<sub>4</sub>F<sub>8</sub> (H<sub>2</sub> currently fitted but closed) : 0 sccm | * C<sub>4</sub>F<sub>8</sub> (H<sub>2</sub> currently fitted but closed) : 0 sccm | ||
* CO<sub>2</sub>: (It is not in the software) | * CO<sub>2</sub>: (It is not in the software) | ||
|ItemComment= | |ItemComment=Only SF<sub>6</sub> and O<sub>2</sub> are used for Si, PR, and Cr etch. The rest is only make-up | ||
}} | }} | ||
{{Template:Peg2configcontent1 | {{Template:Peg2configcontent1 | ||