Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions
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Finally press “Log result” to produce a text output. Copy and paste the output into a text file and save it with your exposure files, for instance to your M-drive. The procedure must naturally be carried out for all substrates that need alignment exposure. | Finally press “Log result” to produce a text output. Copy and paste the output into a text file and save it with your exposure files, for instance to your M-drive. The procedure must naturally be carried out for all substrates that need alignment exposure. | ||
When you are done with the alignment station, please close the programs, log off the computer and turn the microscope illumination down. Alert a member of the loading team to have your prealigned substrates loaded to the auto stocker. | When you are done with the alignment station, please close the programs, log off the computer and turn the microscope illumination down. Alert a member of the loading team to have your prealigned substrates loaded to the auto stocker. | ||
<pre> | |||
PAMS Metrology Tool version 3.2.0.8 | |||
JBX-9500FS Wafer 4 inch A <> | |||
Registration result recorded 09-maj-2023, 11:15 | |||
Global mark P: design (-30000,-20000), stage (160108, 85480) | |||
Global mark Q: design ( 30000,-20000), stage (220107, 85909) | |||
Material cc : offset ( 250, -695), stage (190250, 65695) | |||
Gain 1.00001 | |||
Rotation 0.41 degrees | |||
OFFSET( 108, -480) ;(P mark) | |||
end<> | |||
</pre> | |||
==System calibration== | ==System calibration== | ||