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Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Line 29: Line 29:
HSWITCH OFF,ON
HSWITCH OFF,ON
RESIST 250
RESIST 250
SHOT A,16
SHOT A,24
OFFSET(-44,-139)
OFFSET(88,-335)


END 7
END 7
Line 39: Line 39:
JOB/W    'THOPE',4  ; 4inch wafer
JOB/W    'THOPE',4  ; 4inch wafer


GLMPOS    P=(-30000,0),Q=(30000,0)
GLMPOS    P=(-30000,-20000),Q=(30000,20000)


PATH FT01
PATH FT01
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