Specific Process Knowledge/Characterization/XPS/XPS technique: Difference between revisions
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<!-- Page reviewed 9/8-2022 jmli --> | <!-- Page reviewed 9/8-2022 jmli --> | ||
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=XPS technique= | =XPS technique= | ||
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* '''Surface sensitivity:''' The inelastic mean free path of the photoelectrons is very short - as a result, photoelectrons from depths larger than some 10 monolayers will not contribute to the peaks as they have lost part of their kinetic energy. This makes XPS extremely surface sensitive. | * '''Surface sensitivity:''' The inelastic mean free path of the photoelectrons is very short - as a result, photoelectrons from depths larger than some 10 monolayers will not contribute to the peaks as they have lost part of their kinetic energy. This makes XPS extremely surface sensitive. | ||
The basic principle is shown below | The basic principle is shown below. The image is taken from Wikipedia - click on it to go to the wikipedia page on photoelectron spectroscopy. | ||
[[File:800px-XPS_PHYSICS.jpg|700px| frameless|link=https://en.wikipedia.org/wiki/X-ray_photoelectron_spectroscopy|XPS principle. The image is taken from wikipedia - click on image to access wikipedia directly.]] | [[File:800px-XPS_PHYSICS.jpg|700px| frameless|link=https://en.wikipedia.org/wiki/X-ray_photoelectron_spectroscopy|XPS principle. The image is taken from wikipedia - click on image to access wikipedia directly.]] | ||