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Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions

Thope (talk | contribs)
Thope (talk | contribs)
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The following SDF and JDF files will be used for the example.
The following SDF and JDF files will be used for the example.
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<pre>
;SDF
MAGAZIN 'THOPE'
#8
%4C   
JDF 'thope230126',1
ACC 100
CALPRM '6na_ap5'
DEFMODE 2     
GLMDET A
CHIPAL 1
HSWITCH OFF,ON
RESIST 250
SHOT A,6
OFFSET(-44,-139)
END 8
</pre>
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<pre>
;JDF
JOB/W    'THOPE',4  ; 4inch wafer
GLMPOS    P=(-30000,0),Q=(30000,0)
PATH FT01
  ARRAY (-15000,2,30000)/(10000,2,20000)
ASSIGN A(1) -> ((1,1))
1: ARRAY (-4000,5,2000)/(4000,5,2000)
CHMPOS M1=(-450,450),M2=(450,450),M3=(450,-450),M4=(-450,-450)
ASSIGN P(1) -> (*,*)
  AEND
PEND
LAYER 1
        P(1)  'thope230126.v30'
        SPPRM 4.0,,,,1.0,1
        STDCUR  6
END
</pre>
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