Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment: Difference between revisions
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=Aligned exposure on JEOL 9500= | =Aligned exposure on JEOL 9500= | ||
There is quite a few things to remember in order to align an exposure to an existing pattern. The example below is a step by step guide illustrating global substrate alignment as well as chip alignment. | There is quite a few things to remember in order to align an exposure to an existing pattern. The example below is a step by step guide illustrating global substrate alignment as well as chip alignment. If your job only requires global alignment simply skip the chip alignment part. | ||
==Job preparation== | ==Job preparation== | ||