Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions
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[[file:DRIE-Pegasus.jpg |frame|left|200px|The DRIE-Pegasus 1 load lock and cassette loader in the DTU Nanolab cleanroom A-1. {{photo1}}]] | |||
[[file:Pegasus 2 operator.jpg |frame|center| 100px|The DRIE-Pegasus 2 operator station and load lock in the DTU Nanolab cleanroom A-1. {{photo1}}]] | |||
[[file:Peg3and4 front 2.JPG |frame | right |300px|The DRIE-Pegasus3 and DRIE-Pegasus4 operator station and cassette loading stations. {{photo1}}]] | |||
In 2010 DTU Nanolab acquired DRIE-Pegasus 1 (at the time called Danchip and DRIE-Pegasus, respectively). As a state-of-the-art etch tool with excellent performance and great flexibility, it grew immensely popular and by 2015 it was apparent that we needed yet another tool to cope with the demand. Therefore, in 2016 Pegasus 2 was acquired from a closed-down lab in Morocco and installed next to Pegasus 1. | In 2010 DTU Nanolab acquired DRIE-Pegasus 1 (at the time called Danchip and DRIE-Pegasus, respectively). As a state-of-the-art etch tool with excellent performance and great flexibility, it grew immensely popular and by 2015 it was apparent that we needed yet another tool to cope with the demand. Therefore, in 2016 Pegasus 2 was acquired from a closed-down lab in Morocco and installed next to Pegasus 1. | ||