Specific Process Knowledge/Etch/DRIE-Pegasus/System-description: Difference between revisions
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--[[User:jmli|jmli]] ([[User talk:jmli|talk]]) 26 November 2012 | --[[User:jmli|jmli]] ([[User talk:jmli|talk]]) 26 November 2012 | ||
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This section applies to all Pegasus tools. For Pegasus 4, however, it is less important as dielectrics etches are continuous. | This section applies to all Pegasus tools. For Pegasus 4, however, it is less important as dielectrics etches are continuous. | ||