Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions
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*4 - Four marks are used for position, rotation and gain correction | *4 - Four marks are used for position, rotation and gain correction | ||
*V1 - Virtual mode 1. A single mark position is used for height detection of the substrate, no position correction | *V1 - Virtual mode 1. A single mark position is used for height detection of the substrate, no position correction | ||
* | *V4 - Virtual mode 4. Four mark positions are used for height detection of the substrate, no position correction | ||
In addition to position correction mode 1 and 4 also detects substrate height. The virtual modes are only used to detect substrate height since no mark detection is done. | In addition to position correction mode 1 and 4 also detects substrate height. The virtual modes are only used to detect substrate height since no mark detection is done. Mode S obviously very time consuming for a high number of chips. | ||
If set up properly on good quality marks mode 1 or mode 4 chip alignment can usually execute in about 1-2 seconds per mark. The time estimate at compilation will account for the time spend on chip alignment at the current settings of the '''CHIPAL''' subprogram. | |||
===Chip alignment - JDF === | ===Chip alignment - JDF === | ||