Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 348: Line 348:
END 8
END 8
</pre>
</pre>
'''CHIPAL [mode]'''
'''CHIPAL''' has six modes
*0 - Cancels chip alignment
*S - SEM mode. The user is prompted to use SEM mode to manually find M1
*1 - One mark is used for position correction
*4 - Four marks are used for position, rotation and gain correction
*V1 - Virtual mode 1. A single mark position is used for height detection of the substrate, no position correction
*V1 - Virtual mode 4. Four mark positions are used for height detection of the substrate, no position correction
In addition to position correction mode 1 and 4 also detects substrate height. The virtual modes are only used to detect substrate height since no mark detection is done.


===Chip alignment - JDF ===
===Chip alignment - JDF ===
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/JEOLJobPreparation"