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Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 248: Line 248:
RESIST 152                   
RESIST 152                   
SHOT A,32                   
SHOT A,32                   
OFFSET(0,0)                   
OFFSET(-150,233)                   


END 8
END 8
Line 275: Line 275:


'''HSWITHC''' specifies the substrate height detection mode for aligned exposure. It takes two parameters '''swg''' and '''swc''' which are merely two ON/OFF switches for global mark and chip marks, respectively. If '''swg''' is set to ON the system will carry out substrate height measurement at the global mark positions. If '''swc''' is set to ON the system will carry out substrate height measurement at the chip mark positions. Thus this is a convenient way to have the system measure substrate height and adjust beam focus to chip placement positions. In the example above the global mark positions are used for height detection of the substrate.
'''HSWITHC''' specifies the substrate height detection mode for aligned exposure. It takes two parameters '''swg''' and '''swc''' which are merely two ON/OFF switches for global mark and chip marks, respectively. If '''swg''' is set to ON the system will carry out substrate height measurement at the global mark positions. If '''swc''' is set to ON the system will carry out substrate height measurement at the chip mark positions. Thus this is a convenient way to have the system measure substrate height and adjust beam focus to chip placement positions. In the example above the global mark positions are used for height detection of the substrate.
'''OFFSET[x,y]'''
For aligned exposures the '''OFFSET''' command must be used to state the offset of the P mark as determined by the optical pre-aligner. This offset will be applied to the entire content of the JDF file, i.e. the offset is used to shift the mark scan detection position. In the example above the pre-aligner was used to determine the P mark is shifted -150 µm in x and 233 µm in y relative to the center of the exposure/cassette slot.


===Global alignment JDF===
===Global alignment JDF===
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