Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions
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The JDF file has two additional commands, '''GLMPOS''' and '''GLMP'''. | |||
'''GLMPOS [P=(x1,y1), Q=(x2,y2)]''' | |||
'''GLMPPOS''' defines the global alignment mark coordinates in the substrate coordinate system and hence where '''SETWFR''' will perform beam scans for mark detection, unit is µm. In the example file the global marks are located at x = ±36000 µm and y = 0. | |||
'''GLMP [w,l,t,f]''' | |||
'''GLMP''' allows the user to add dimension and shape information about the alignment mark. The first parameter, '''w''', defines the width of the mark, unit is µm. The second parameter, '''l''', defines the length of the mark, unit is µm. For a cross this is the length of a single leg of the cross. The third parameter, '''t''' allows the user to toggle between a cross (0) and an L (1). The last parameter, '''f''', defines the rotation of the mark in case an L mark is used. It is most advisable to use a cross, i.e. keep the last two parameters at 0. In the example above a 2 µm line width cross with a length of 450 µm is used. | |||
==Chip alignment== | ==Chip alignment== | ||