Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions
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==Global alignment - | ==Global alignment - SDF== | ||
The following | The following files set up a single pattern for exposure with global alignment. To execute global alignment a few extra commands are used compared to the previous example. Only new commands are explained below. | ||
<pre> | <pre> | ||
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Compared to the first print exposure the SDF file has three extra commands, '''GLMDET''', '''CHIPAL''' and '''HSWITCH'''. | Compared to the first print exposure the SDF file has three extra commands, '''GLMDET''', '''CHIPAL''' and '''HSWITCH'''. | ||
==Global alignment - | ==Global alignment - JDF== | ||
<pre> | <pre> | ||
JOB/W 'ELELOP',4 | JOB/W 'ELELOP',4 | ||